SURFACE POSITION DETECTING APPARATUS, METHOD OF ADJUSTING THE FOCUSING APPARATUS, SURFACE POSITION DETECTING METHOD, EXPOSING APPARATUS AND METHOD OF MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a surface position detecting apparatus and method capable of accurately detecting the surface position to be detected, a method of adjusting the focusing apparatus which enables accurate calibration manipulation, an exposing apparatus which can improve the exposing accuracy and a method of effectively manufacturing device of the high integration density. SOLUTION: The detecting surface 76 of a wave-front aberration measuring unit 75 is set to the focusing surface of a projected optical system PL using an AF sensor 45 based on the reference position previously stored in a control system 33. A measuring beam RL including an image of pin-hole PH of a test reticle Rt is controlled to be incident to the wave-front aberration measuring unit 75 to measure the wave- front aberration information of the projected optical system PL and this measuring beam RL is developed to various elements including the defocus element using the polynomial of Zernike. Location of the detecting surface 76 is adjusted to make zero the defocus element and the location of the detecting surface 76 is measured again with the AF sensor 45. The AF sensor 45 can be calibrated by updating the location information of the detecting surface 76 with the re-measurement of the reference location.