Optical process amendment of the rational IC mask layout which is due to the reuse of amendment

摘要

(57) Abstract The EDA tool, when being decided, that the 2nd field, is the 1st field and equivalence with the purpose of OPC, reuses the amendment which is decided vis-a-vis that 1st field, with respect to the 2nd field, optical and/or the OPC module which runs process preliminary compensation is had with rational manner vis-a-vis IC mask layout. OPC module in every field, runs amendment vis-a-vis IC mask layout, as for that amendment, with one execution configuration, repeatedly using the model based simulation which includes resist model based simulation and optical model based simulation, decides.