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Photo thyristor component and bidirectional photo thyristor component

机译:光电晶闸管组件和双向光电晶闸管组件

摘要

PROBLEM TO BE SOLVED: To prevent zero-cross operation failures by a parasitic capacitance of a semi-insulating film to operate stably an AC voltage in a photo-thyristor element incorporated with a MOSFET for obtaining a zero-cross function, comprising a photodiode or a phototransistor for photodriving a gate of the MOSFET, and having a high breakdown voltage passivation film provided with an oxygen dope semi-insulating film on an insulation film. SOLUTION: A semi-insulating film 13 is patterned so as not to enter parasitic resistance by a semi-insulation film 13 between a gate and a source of a MOSFET 14, and between the gate of the MOSFET 14 and a cathode of a thyrister 30. Furthermore, since a punch-through voltage is stabilized, regions (a part of distance Lp) above the base and a collector junction j2 of a photoresistor 21 and above a junction j1 of a P-type diffused region adjacent so as to enclose therewith, and regions between them are coated with the semi- insulating film 13 or a metal layer 20 of an Al wiring, etc., for shielding.
机译:要解决的问题:通过半绝缘膜的寄生电容来防止过零操作失败,以使装有MOSFET的光电晶闸管元件中的交流电压稳定工作,从而获得过零功能,该组件包括一个光电二极管或一个一种光电晶体管,用于光驱动MOSFET的栅极,并具有高击穿电压钝化膜,在绝缘膜上设有氧掺杂半绝缘膜。解决方案:对半绝缘膜13进行构图,以免在MOSFET 14的栅极和源极之间以及MOSFET 14的栅极和晶闸管30的阴极之间通过半绝缘膜13进入寄生电阻。此外,由于穿通电压是稳定的,所以光敏电阻21的基极和集电极结j2上方以及相邻的P型扩散区的结j1上方的区域(距离Lp的一部分)被包围。并且,在它们之间的区域涂覆有半绝缘膜13或Al布线等的金属层20以进行屏蔽。

著录项

  • 公开/公告号JP3403123B2

    专利类型

  • 公开/公告日2003-05-06

    原文格式PDF

  • 申请/专利权人 シャープ株式会社;

    申请/专利号JP19990203929

  • 发明设计人 鞠山 満;中島 聡司;

    申请日1999-07-16

  • 分类号H01L29/74;H01L29/747;H01L31/111;

  • 国家 JP

  • 入库时间 2022-08-22 00:18:41

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