METHOD FOR MEASURING TRANSPORT FACTOR OF SPUTTER PARTICLE, FILM DEPOSITION METHOD, TARGET, SPUTTERING SYSTEM, AND FILM THICKNESS SIMULATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method for measuring the transport factor of sputter particles in which the straight-moving components of the sputter particles and the transport factor of the scattering components thereof on a substrate can be separately obtained, and a film thickness simulation method.;SOLUTION: (a) The quantity of the straight-moving components reaching the substrate from a very small area of a target is measured by allowing only the straight-moving components to reach the substrate while removing the scattering components from the sputter particles generated from the very small area on the target by a scattering component removing means, (b) both the scattering components and the straight-moving components of the sputter particles generated from the very small area on the target are allowed to reach the substrate without passing the scattering component removing means, and the quantity of the scattering components reaching the substrate is measured by subtracting the quantity of the straight- moving components from the total quantity of the reaching components, and (c) respective transport factors Pm of the straight-moving components and the scattering components are obtained from the relationship between the quantity of the sputter particles generated from the very small area on the target and the reaching quantity of the straight-moving components and the scattering components.;COPYRIGHT: (C)2003,JPO