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Optical thin film, optical component formed with this optical thin film, antireflection film, and plastic optical component formed with this antireflection film

机译:光学薄膜,由该光学薄膜形成的光学部件,防反射膜以及由该防反射膜形成的塑料光学部件

摘要

PURPOSE:To obtain a film which can be easily formed with good productivity by using a conventional device and has enough adhesion property and excellent resistance against heat cycles without causing deterioration in surface accuracy of a substrate. CONSTITUTION:An antireflection film for plastic optical parts is formed in such a manner that the film contains at least one lays containing at least one of MoO3 and WO3. It is preferable that the first layer in the substrate side is a Si oxide layer having =2nm optical thickness and that one of the second and other layers consists of at least one of MoO3 and WO3. Further, at least one of MoO3 and WO3 may be mixed with other dielectric material to obtain the material for vapor deposition of optical films.
机译:目的:获得一种膜,该膜可以通过使用常规装置容易地以良好的生产率形成,并且具有足够的粘附性和优异的抗热循环性,而不会引起基板的表面精度下降。组成:用于塑料光学部件的减反射膜的形成方式是,该膜包含至少一层包含MoO3和WO3中至少一种的层。优选的是,基板侧的第一层是光学厚度≥2nm的氧化硅层,并且第二层和其他层中的一层由MoO 3和WO 3中的至少一个构成。此外,MoO 3和WO 3中的至少一种可以与其他介电材料混合以获得用于光学膜的气相沉积的材料。

著录项

  • 公开/公告号JP3353931B2

    专利类型

  • 公开/公告日2002-12-09

    原文格式PDF

  • 申请/专利权人 オリンパス光学工業株式会社;

    申请/专利号JP19930034183

  • 发明设计人 川俣 健;

    申请日1993-01-29

  • 分类号G02B1/11;

  • 国家 JP

  • 入库时间 2022-08-22 00:17:56

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