首页> 外国专利> METHOD OF MANUFACTURING MASTER DISK FOR OPTICAL DISK, METHOD OF MANUFACTURING STAMPER FOR OPTICAL DISK, STAMPER FOR OPTICAL DISK, AND METHOD OF MANUFACTURING MOLDED RESIN FOR OPTICAL DISK, AND MOLDED SUBSTRATE FOR OPTICAL DISK

METHOD OF MANUFACTURING MASTER DISK FOR OPTICAL DISK, METHOD OF MANUFACTURING STAMPER FOR OPTICAL DISK, STAMPER FOR OPTICAL DISK, AND METHOD OF MANUFACTURING MOLDED RESIN FOR OPTICAL DISK, AND MOLDED SUBSTRATE FOR OPTICAL DISK

机译:用于制造光学盘的主盘的方法,用于制造光学盘的压模的方法,用于光学盘的压模的方法以及制造用于光学盘的模制树脂的方法以及用于光学盘的模制基质的方法

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a master disk for an optical disk which can stably form patterns below the diameter of a convergent beam for exposure with decreased fluctuations in shape by using a simple apparatus.;SOLUTION: The method of manufacturing the master disk for the optical disk has a process step of forming a lower layer 12 consisting of a non-photosensitive hydrophilic polymeric material on a substrate 11, a process step of forming an upper layer 13 consisting of a photosensitive resin on this lower layer, a process step of forming a latent image 16 by exposing the upper layer 13 by the first light 14 formed by condensing a laser beam, a process step of forming the patterns by the exposure on the upper layer 13 by developing and cleaning with pure water, a process step of etching the lower layer 12 subjected to the cleaning with the pure water by irradiating the layer with the second light 17 from the upper layer side, and a process step of peeling the upper layer 13 used as a mask, in which the second light 17 to be cast to the substrate surface includes a wavelength from 220 to 320 nm and the maximum intensity of the light below 200 nm is below 1/40 the maximum intensity of the light of 220 to 320 nm.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种用于制造光盘的母盘的方法,该方法可以通过使用简单的设备稳定地形成会聚光束的直径以下的图案以进行曝光,并且形状的波动减小,从而解决该问题。光盘的母盘具有在基板11上形成由非感光性亲水性高分子材料构成的下层12的工序,在该下层形成由感光性树脂构成的上层13的工序,通过用会聚激光束形成的第一光14使上层13曝光来形成潜像16的工艺步骤,通过用纯水显影和清洁通过在上层13上曝光而形成图案的工艺步骤,通过从上层侧照射第二光17,用纯水蚀刻经过清洗的下层12的工艺步骤和剥离步骤。在用作掩模的上层13中,要投射到衬底表面的第二光17的波长为220至320 nm,低于200 nm的光的最大强度小于1/40的最大强度。 220至320 nm的光;版权:(C)2003,JPO

著录项

  • 公开/公告号JP2003242695A

    专利类型

  • 公开/公告日2003-08-29

    原文格式PDF

  • 申请/专利权人 RICOH CO LTD;

    申请/专利号JP20020033913

  • 发明设计人 HASHIGUCHI TSUTOMU;

    申请日2002-02-12

  • 分类号G11B7/26;

  • 国家 JP

  • 入库时间 2022-08-22 00:17:23

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