首页> 外国专利> METHOD OF MANUFACTURING III-V COMPOUND SEMICONDUCTOR CRYSTAL CONTAINING ANTIMONY

METHOD OF MANUFACTURING III-V COMPOUND SEMICONDUCTOR CRYSTAL CONTAINING ANTIMONY

机译:制造含锑的III-V族化合物半导体晶体的方法

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a III-V compound semiconductor crystal containing antimony for upgrading the quality of a compound semiconductor crystal containing antimony grown by using a metal-organic vapor- phase growth method.;SOLUTION: This method is to manufacture a III-V compound semiconductor crystal containing antimony, which contains at least two kinds or more of group-V components, one of which is antimony, by alternately and periodically repeating a first process of simultaneously supplying a source gas for a group-III component and a source gas for antimony, and a second process of simultaneously supplying the source gas for the group-III component and source gases for group-V components other than antimony.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种制造含锑的III-V族化合物半导体晶体的方法,以提高通过使用金属有机气相生长法生长的含锑的化合物半导体晶体的质量。通过交替且周期性地重复同时供应第一组气体的第一过程来制造包含锑的III-V化合物半导体晶体,该晶体包含至少两种或多种V组成分,其中一种是锑。 III组分和锑的原料气,以及同时供应III族组分的原料气和V族组分(锑)以外的原料气的第二种方法。版权所有:(C)2003,JPO

著录项

  • 公开/公告号JP2003115455A

    专利类型

  • 公开/公告日2003-04-18

    原文格式PDF

  • 申请/专利权人 NIPPON TELEGR & TELEPH CORP NTT;

    申请/专利号JP20010309654

  • 发明设计人 ODA YASUHIRO;WATANABE NORIYUKI;

    申请日2001-10-05

  • 分类号H01L21/20;H01L21/205;

  • 国家 JP

  • 入库时间 2022-08-22 00:16:39

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