首页> 外国专利> BLACK PHOTOSENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX USING THE SAME AND METHOD FOR PRODUCING THE SAME

BLACK PHOTOSENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX USING THE SAME AND METHOD FOR PRODUCING THE SAME

机译:用于黑色矩阵的黑色光敏树脂组合物,使用该黑色矩阵的黑色矩阵和制造该黑色矩阵的方法

摘要

PROBLEM TO BE SOLVED: To provide a black photosensitive resin composition for a black matrix capable of forming a black matrix having satisfactory adhesive power, a sufficient light extinction density and a low reflectance and free from protrusions due to overlapping with colored pixels without dissolving the black photosensitive resin composition in frame parts even in the case of over-development in formation and to provide a black matrix and a method for producing the matrix.;SOLUTION: In the black photosensitive resin composition consisting essentially of a hydroxystyrene-base high molecular compound resin which is crosslinked under an acid, a crosslinker, a photo-acid generator and grafted carbon black, the high molecular compound resin is a copolymer comprising 39 mol% units of formula (1), 49 mol% units of formula (2) and 12 mol% units of formula (3).;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种用于黑色矩阵的黑色光敏树脂组合物,该组合物能够形成具有令人满意的粘合力,足够的消光密度和低反射率的黑色矩阵,并且由于与彩色像素重叠而不会由于不溶解黑色而形成突起甚至在形成中过度显影的情况下,也可以在框架部件中使用光敏树脂组合物,从而提供黑色基质及其制备方法。解决方案:在黑色光敏树脂组合物中,其主要成分为羟基苯乙烯基高分子化合物树脂在酸,交联剂,光酸产生剂和接枝的炭黑下交联的高分子化合物树脂是包含39mol%的式(1)单元,49mol%的式(2)单元和12的共聚物。式(3)的mol%单元。;权利:(C)2003,日本特许厅

著录项

  • 公开/公告号JP2003015294A

    专利类型

  • 公开/公告日2003-01-15

    原文格式PDF

  • 申请/专利权人 TOPPAN PRINTING CO LTD;

    申请/专利号JP20010201838

  • 发明设计人 KITA SHINICHI;SUDA HIRONOBU;

    申请日2001-07-03

  • 分类号G03F7/038;C08F212/14;G02B5/00;G02B5/20;G02B5/22;G02F1/1335;G03F7/004;G03F7/033;

  • 国家 JP

  • 入库时间 2022-08-22 00:16:33

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