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BLACK PHOTOSENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX USING THE SAME AND METHOD FOR PRODUCING THE SAME
BLACK PHOTOSENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX USING THE SAME AND METHOD FOR PRODUCING THE SAME
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机译:用于黑色矩阵的黑色光敏树脂组合物,使用该黑色矩阵的黑色矩阵和制造该黑色矩阵的方法
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摘要
PROBLEM TO BE SOLVED: To provide a black photosensitive resin composition for a black matrix capable of forming a black matrix having satisfactory adhesive power, a sufficient light extinction density and a low reflectance and free from protrusions due to overlapping with colored pixels without dissolving the black photosensitive resin composition in frame parts even in the case of over-development in formation and to provide a black matrix and a method for producing the matrix.;SOLUTION: In the black photosensitive resin composition consisting essentially of a hydroxystyrene-base high molecular compound resin which is crosslinked under an acid, a crosslinker, a photo-acid generator and grafted carbon black, the high molecular compound resin is a copolymer comprising 39 mol% units of formula (1), 49 mol% units of formula (2) and 12 mol% units of formula (3).;COPYRIGHT: (C)2003,JPO
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