PLASMA CVD DEVICE AND CONTROL METHOD THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a plasma CVD device capable of preventing attraction of an insulating substrate to a mask member by the charge-up, and a control method thereof. ;SOLUTION: The plasma CVD device comprises a vacuum chamber capable of maintaining vacuum, a gas feed/exhaust device to exhaust gas into a vacuum chamber while feeding gas therein, a first electrode capable of applying the high frequency power and connected to a high frequency power source, a second electrode which is disposed facing the first electrode with a substrate placed thereon, and a mask member disposed between the first electrode and the second electrode, and a metal member insulated from the grounding electric potential is disposed on a back side of the mask member.;COPYRIGHT: (C)2003,JPO