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PLASMA CVD APPARATUS, PROGRAM FOR CONTROLLING PLASMA CVD APPARATUS, AND METHOD FOR CLEANING PLASMA CVD APPARATUS
PLASMA CVD APPARATUS, PROGRAM FOR CONTROLLING PLASMA CVD APPARATUS, AND METHOD FOR CLEANING PLASMA CVD APPARATUS
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机译:等离子体CVD设备,控制等离子体CVD设备的程序以及清洁等离子体CVD设备的方法
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摘要
PROBLEM TO BE SOLVED: To provide a plasma CVD apparatus which can effectively clean a reaction chamber with plasma; a program for controlling the plasma CVD apparatus; and a method for cleaning the plasma CVD apparatus.;SOLUTION: A high-frequency power source 104 of the plasma CVD apparatus has an output impedance of 50 Ω. A composition of a substance converted into plasma changes as a cleaning operation progresses, and impedance in the reaction chamber changes. A second detecting part 241 detects a change of voltage and an electric current to detect the impedance. An adjusting part 242 controls the capacitance of a second variable-capacitance condenser 225 by rotating a second motor 234 so that the impedance matches with the output impedance.;COPYRIGHT: (C)2008,JPO&INPIT
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