首页> 外国专利> POROUS SILICA FILM-FORMING COATING HAVING EXCELLENT STORAGE STABILITY, METHOD FOR PRODUCING COATING, AND METHOD FOR PRODUCING POROUS SILICA FILM HAVING REGULARLY ARRANGED UNIFORM MESOPORE, POROUS SILICA FILM AND ITS USE

POROUS SILICA FILM-FORMING COATING HAVING EXCELLENT STORAGE STABILITY, METHOD FOR PRODUCING COATING, AND METHOD FOR PRODUCING POROUS SILICA FILM HAVING REGULARLY ARRANGED UNIFORM MESOPORE, POROUS SILICA FILM AND ITS USE

机译:具有良好存储稳定性的多孔二氧化硅成膜涂层,生产方法以及生产规则排列均匀的介孔的多孔二氧化硅膜,多孔二氧化硅膜及其用途

摘要

PROBLEM TO BE SOLVED: To provide a porous silica film-forming coating which excels in storage stability, a porous silica film which is produced by using the coating, has regularly arranged uniform pores and is used in optically functional materials and electronically functional materials, and a method for producing the coating.;SOLUTION: The coating for forming the porous silica film which has excellent storage stability is obtained by adding, in the presence of a surface active agent, an aprotic organic compound having a dielectric constant at 25°C of ≥25 to a reaction solution obtained by partially subjecting alkoxysilanes to hydrolysis and dehydration condensation.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:为了提供优异的储存稳定性的多孔二氧化硅膜形成涂层,通过使用该涂层制备的多孔二氧化硅膜具有规则排列的均匀孔,并用于光学功能材料和电子功能材料,以及解决方案:通过在表面活性剂的存在下,添加介电常数为25℃的非质子有机化合物,制得具有优异储存稳定性的二氧化硅多孔膜。 ge 25到通过使烷氧基硅烷部分水解和脱水缩合得到的反应溶液中。;版权所有:(C)2003,日本特许厅

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