首页>
外国专利>
ORGANOCOPPER COMPOUND FOR METAL ORGANIC CHEMICAL VAPOR DEPOSITION AND COPPER THIN FILM PREPARED BY USING THE SAME
ORGANOCOPPER COMPOUND FOR METAL ORGANIC CHEMICAL VAPOR DEPOSITION AND COPPER THIN FILM PREPARED BY USING THE SAME
展开▼
机译:用于金属有机气相沉积的有机铜化合物和铜薄膜的制备。
展开▼
页面导航
摘要
著录项
相似文献
摘要
PROBLEM TO BE SOLVED: To obtain an organocopper compound for metal organic chemical vapor deposition, which is readily vaporizable, stably supplied as a raw material in film forming, with which a film-forming speed is improved, a metal organic chemical vapor deposition apparatus is hardly corroded, treatment of exhaust gas in a MOCVD process is not complicated and adhesivity to a substrate film is excellent.;SOLUTION: The organometallic compound for metal organic chemical vapor deposition is represented by general formula (1) or formula (2) (R1 is a methyl group and R2 is an isobutyl group, R1 is a methyl group and R2 is an isopropyl group or R1 is an isobutyl group and R2 is a t-butyl group).;COPYRIGHT: (C)2003,JPO
展开▼