METHOD FOR ELECTRON BEAM LITHOGRAPHY, BASE MATERIAL PLOTTED BY THE METHOD AND ELECTRON BEAM LITHOGRAPHIC EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To provide a method for electron-beam lithography by which a diffraction structure shape in a state overhung is formed according to the curved surface structure of a base material and a finer grating pitch is realized, and to provide a base material plotted by the same and electron beam lithographic equipment.;SOLUTION: The electron beam lithographic equipment carries out plotting on the base material by scanning the base material with the electron beam. The equipment has a storage means to store characteristics of dose distribution in which the dose distribution to a scanning position has been defined in advance. The equipment has a control means to control the plotting on the base material while calculating the dose on the basis of the characteristics of dose distribution of the storage means.;COPYRIGHT: (C)2003,JPO