FINE PATTERN DRAWING MATERIAL, DRAWING METHOD USING THE SAME AND FINE PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a fine pattern drawing method and a fine pattern forming method capable of microfabrication far below the diffraction limit without requiring a large-sized equipment, not accompanied by the deformation or evaporation of a resist material due to a sudden temperature rise, capable of extending the range of usable light and usable in combination with the existing photolithography, and to provide a new material used in the methods. ;SOLUTION: The fine pattern drawing material is obtained by disposing a layer which absorbs light and converts it into heat and a photosensitive and heat sensitive material layer on a substrate. In the fine pattern drawing method, a fine pattern is drawn using the material by irradiation with light. In the fine pattern forming method, pattern drawing is carried out using the fine pattern drawing material by irradiation with light and exposure and development are further carried out.;COPYRIGHT: (C)2003,JPO