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MANUFACTURING METHOD FOR FeTaN SOFT MAGNETIC THIN FILM FOR MAGNETIC ELEMENT

机译:磁性元件FeTaN软磁性薄膜的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method for a FeTaN soft magnetic thin film for a magnetic element.;SOLUTION: The manufacturing method is based on comprising a stage of providing a substrate for thin film formation at a spot isolated from an Fe target by a prescribed distance; a stage of mounting a plurality of Ta small pieces on a surface of the Fe target, turning the Fe target to a cathode and the substrate to an anode to apply the DC voltage of a prescribed size between two electrodes under a prescribed pressure of an argon/nitrogen gaseous mixture and forming a FeTaN thin film on the substrate by a sputtering system, and a stage of postheating the FeTaN thin film, so as to form fine crystal grains inside the formed FeTaN thin film. Methods of forming a Ti-based layer, below the FeTaN thin film and elevating a temperature of the substrate, instead of post-heating or the like, are introduced.;COPYRIGHT: (C)2003,JPO
机译:解决的问题:提供一种用于磁性元件的FeTaN软磁性薄膜的制造方法;解决方案:该制造方法基于以下步骤:在与Fe靶隔离的部位提供用于形成薄膜的基板。按规定的距离;将多个Ta小片安装在Fe靶材的表面上的步骤,将Fe靶材转到阴极,将衬底转到阳极,以在氩气的规定压力下在两个电极之间施加规定大小的直流电压/氮气体混合物,并通过溅射系统在基板上形成FeTaN薄膜,以及对FeTaN薄膜进行后加热的阶段,以在形成的FeTaN薄膜内形成细晶粒。介绍了在FeTaN薄膜下方形成Ti基层并提高基板温度的方法,而不是后加热或类似方法。;版权:(C)2003,JPO

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