OPTICAL MEASURING APPARATUS, OPTICAL MEASURING METHOD, OPTICAL METHOD FOR DETECTING THICKNESS OF FILM, AND SEMICONDUCTOR MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To accurately detect the thickness of a film by using an optical method with a simple structure.;SOLUTION: The optical measuring apparatus is composed of an optical system (130) which includes a light source (105) and a spectral reflectance meter (107), a nozzle (104) which has an optical window (103) transmitting light from the light source (105) onto a sample, a supplying tube (110) being connected to the nozzle (104), having at least two branch tubes (121, 122) and supplying media different from each other, and flow regulating means (111, 112) which are disposed on the branch tubes (110) respectively. The aperture window (103) is arranged opposite to the sample. Different measuring environment is established by supplying different media into a space formed between the optical window and the surface of the sample using the flow regulating means. The spectral reflectance meter (107) measures reflecting interference light being reflected by the sample in each measuring environment.;COPYRIGHT: (C)2003,JPO