首页> 外国专利> Four terminal memory cell, a two-transistor SRAM cell, a SRAM array, a computer system, a process for forming a SRAM cell, a process for turning a SRAM cell off, a process for writing a SRAM cell and a process for reading data from a SRAM cell

Four terminal memory cell, a two-transistor SRAM cell, a SRAM array, a computer system, a process for forming a SRAM cell, a process for turning a SRAM cell off, a process for writing a SRAM cell and a process for reading data from a SRAM cell

机译:四端子存储单元,两晶体管SRAM单元,SRAM阵列,计算机系统,用于形成SRAM单元的过程,用于关闭SRAM单元的过程,用于写入SRAM单元的过程以及用于读取数据的过程来自SRAM单元

摘要

A two-transistor SRAM cell includes a first FET. The first FET is an ultrathin FET of a first polarity type and includes a control electrode, a first load electrode and a second electrode. The first load electrode is coupled to a first control line. The SRAM cell also includes a second FET. The second FET is an ultrathin FET of a second polarity type and includes a gate, a source and a drain. The second FET source is coupled to the first FET gate. The second FET gate is coupled to the first FET drain and the second FET source is coupled to a first potential. The SRAM cell further includes a first load device that is coupled between a second potential and the first FET gate. The SRAM cell additionally includes a second load device coupled between the second FET gate and a second control line.
机译:两晶体管SRAM单元包括第一FET。第一FET是第一极性类型的超薄FET,并且包括控制电极,第一负载电极和第二电极。第一负载电极耦合到第一控制线。 SRAM单元还包括第二FET。第二FET是第二极性类型的超薄FET,并且包括栅极,源极和漏极。第二FET源极耦合到第一FET栅极。第二FET栅极耦合到第一FET漏极,第二FET源极耦合到第一电势。 SRAM单元还包括耦合在第二电势和第一FET栅极之间的第一负载装置。 SRAM单元还包括耦合在第二FET栅极和第二控制线之间的第二负载装置。

著录项

  • 公开/公告号US2003048657A1

    专利类型

  • 公开/公告日2003-03-13

    原文格式PDF

  • 申请/专利权人 FORBES LEONARD;

    申请/专利号US20020202551

  • 发明设计人 LEONARD FORBES;

    申请日2002-07-23

  • 分类号G11C11/00;

  • 国家 US

  • 入库时间 2022-08-22 00:12:06

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