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Lithography device wich uses a source of radiation in the extreme ultraviolet range and multi-layered mirrors with a broad spectral band in this range
Lithography device wich uses a source of radiation in the extreme ultraviolet range and multi-layered mirrors with a broad spectral band in this range
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机译:光刻设备可使用极紫外范围内的辐射源和该范围内较宽光谱带的多层反射镜
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摘要
Lithography device using a source of radiation in the extreme ultraviolet range and multi-layered mirrors with a broad spectral band within this range. ;Each mirror (24, 26, 29) comprises a stack of layers of a first material and layers of a second material alternating with the first material. The first material has an atomic number greater than that of the second material. The thickness of pairs of adjacent layers is a monotonic function of the depth in the stack. The source (22) comprises at least one target (28) which emits the radiation by interaction with a laser beam focused on one of its faces. A part (36) of the radiation emitted from the other face is used. The invention is applicable to the manufacture of integrated circuits with a high degree of integration.
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