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Niobium or vanadium substituted strontium titanate barrier intermediate a silicon underlayer and a functional metal oxide film
Niobium or vanadium substituted strontium titanate barrier intermediate a silicon underlayer and a functional metal oxide film
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机译:铌或钒取代的钛酸锶锶阻挡层,位于硅底层和功能性金属氧化物膜中间
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摘要
A ferroelectric memory cell formed on a monocrystalline silicon underlayer, either an epitaxial silicon contact plug to a transistor source or drain or silicon gate region for which the memory cell forms a non-volatile gate. A conductive barrier layer of vanadium or niobium substituted strontium titanate is epitaxially grown over the silicon, and a lower metal oxide electrode layer, a ferroelectric layer and an upper metal oxide electrode layer are epitaxially grown on the barrier layer. No platinum barrier is needed beneath the ferroelectric stack. The invention can be applied to many other functional oxide devices including micromachined electromechanical (MEM) devices and ferromagnetic tri-layer devices.
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