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Castellation technique for improved lift-off of photoresist in thin-film device processing and a thin-film device made thereby
Castellation technique for improved lift-off of photoresist in thin-film device processing and a thin-film device made thereby
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机译:在薄膜器件加工中改善光刻胶剥离的lift形技术及其制造的薄膜器件
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摘要
A castellation technique for improved lift-off of deposited thin film on photoresist in thin-film device processing of particular utility in the production of magnetic data transducers and recording heads. By correctly designing the edge boundary of a photoresist structure, enhanced regions of low resist edge bombardment and low deposit penetration may be achieved. These enhanced regions enable the lift-off of extra thick deposited regions that would not be otherwise achievable through the use of conventional techniques with and without castellation.
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