首页> 外国专利> Fabrication method for correcting member, fabrication method for projection optical system, and exposure apparatus

Fabrication method for correcting member, fabrication method for projection optical system, and exposure apparatus

机译:校正构件的制造方法,投影光学系统的制造方法以及曝光装置

摘要

A fabrication method for a projection optical system is capable of easily determining the corrected surface form as a desired continuous surface provided to a correcting member for correcting residual aberration. The fabrication includes: a measurement step of measuring aberration remaining in the projection optical system; a hypothesis step of hypothesizing a corrected surface form to be provided to the correcting member based on predetermined functions; a calculation step of calculating wavefront information of a light beam which passes through each of a plurality of regions on the correcting member having the corrected surface form hypothesized in the hypothesis step; and an evaluation step of evaluating the remaining aberration in the projection optical system when the hypothesized corrected surface form hypothesized in the hypothesis step is provided to the correcting member based on the measurement result in the measurement step and on the wavefront information calculated in the calculation step.
机译:投影光学系统的制造方法能够容易地将校正后的表面形状确定为提供给用于校正残留像差的校正构件的期望的连续表面。该制造包括:测量步骤,该步骤测量残留在投影光学系统中的像差;以及假设步骤,基于预定函数假设要提供给校正构件的校正表面形状;计算步骤,计算通过假设步骤中假设的具有校正后的表面形状的校正部件上的多个区域中的每个区域的光束的波前信息;并且,根据上述测量步骤中的测量结果和上述计算步骤中计算出的波前信息,将上述假设步骤中假设的假设校正面形状提供给上述校正部件时,对投影光学系统中的剩余像差进行评价的评价步骤。 。

著录项

  • 公开/公告号US6639651B2

    专利类型

  • 公开/公告日2003-10-28

    原文格式PDF

  • 申请/专利权人 NIKON CORPORATION;

    申请/专利号US20010014136

  • 发明设计人 TOMOYUKI MATSUYAMA;

    申请日2001-12-13

  • 分类号G03B276/80;G03B277/20;G03B273/20;

  • 国家 US

  • 入库时间 2022-08-22 00:05:20

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号