A method (100) of characterizing optical proximity correction designs includes performing a mathematical transform (160) on a first feature (150) and a second feature (167) each having a core portion (152) and a first OPC design and a second OPC design applied thereto, respectively. The method (100) further includes obtaining a metric (162) for the transformed first and second features, wherein the metric is based upon a capability of a pattern transfer system which will utilize masks employing the first and second features (150, 167) as a patterns thereon. One of the first feature or the second feature is then selected (170) based upon an application of the metric to the first and second transformed features (150, 167), thereby selecting the one of the first feature or the second feature which provides for a better pattern transfer performance.
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