Photomask blanks with embedded damping phase offset

摘要

Attenuating embedded phase shift photomask blanks capable of producing a phase shift of 180 DEG and having an optical transmissivity of at least 0.001 at selected lithographic wavelengths 400 nm comprise at least one layer of an aluminum compound and at least one component that is more optically absorbing than the aluminum compound at selected lithographic wavelengths 400 nm and are made by depositing at least one layer of an aluminum compound and at least one component that is more optically absorbing than the aluminum compound onto a substrate.