MAGNET ARRAY IN CONJUNCTION WITH ROTATING MAGNETRON FOR PLASMA SPUTTERING

摘要

An array (60) of auxiliary magnets positioned along sidewalls (14) of a magnetron sputter reactor on a side towards the wafer from the target (16). The magnetron preferably is a small, strong one having a stronger outer pole (42) of a first magnetic polarity surrounding a weaker pole (40) of a second magnetic polarity and rotates about the central axis (38) of the chamber. The auxiliary magnets preferably have the first magnetic polarity to draw the unbalanced magnetic field component toward the wafer. The auxiliary magnets may be either permanent magnets (62) or electromagnets (90).