首页> 外国专利> PROCESS FOR CONTROLLING THERMAL HISTORY OF VACANCY-DOMINATED, SINGLE CRYSTAL SILICON

PROCESS FOR CONTROLLING THERMAL HISTORY OF VACANCY-DOMINATED, SINGLE CRYSTAL SILICON

机译:空位主导的单晶硅的热历史控制过程

摘要

The production of vertical pulling method monocrystal silicon has uniform thermal history. In the process, the power being fed into side heater reduces the relatively aft section of main body, and optionally in end cone growth period, ingot casting, while the power for being fed into bottom heater gradually increases the identical part in growth. Most of crystal ingot can be obtained finished product chip and have few light point defects more than about 0. by method of the invention2 microns and improved gate oxide integrity.
机译:垂直拉制法单晶硅的生产具有均匀的热历史。在该过程中,馈入侧加热器的功率减小了主体的相对后部部分,并且可选地,在锥体生长的最后阶段减少了铸锭的铸造,而馈入底部加热器的功率逐渐增大了相同部分的生长。通过本发明的方法,大多数的晶锭可以通过成品芯片获得,并且具有很少的大于约0的光点缺陷。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号