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Preparation of photocatalytic thin film and water-treatment apparatus using thereof

机译:光催化薄膜的制备及其水处理装置

摘要

PURPOSE: A method for preparation of a photocatalyst thin film with high activity and strong adherence on substrate, and a water treatment apparatus using the photocatalyst thin film are provided to sterilize germs and oxidize recalcitrant toxic compounds such as agricultural chemicals and trihalomethane in wastewater/sewage. CONSTITUTION: The method for preparation of a photocatalyst thin film with high activity and strong adherence on substrate includes the steps of (a) mixing 1 to 50 wt.% of titanium-based inorganic binder, 0.1 to 30 wt.% of organic solvent and 0.01 to 5 wt.% of inorganic acid, followed by agitation for 0.1 to 10 hrs; (b) mixing 1 to 30 wt.% of organic polymer and 5 to 50 wt.% of organic solvent; (c) mixing a resultant from the first step with a resultant from the second step, followed by agitation for 0.5 to 10 hrs; (d) adding 1 to 30 wt.% of chelator, 0.001 to 5 wt.% of surfactant and 0.1 to 10 wt.% of photocatalyst powder to the resultant from the third step, followed by ultrasonication for 0.1 to 10 hrs to prepare a photocatalyst sol; (e) coating the photocatalyst sol on a substrate by dip coating or spray coating method; (f) drying the coated substrate at 50 to 450 deg.C for 0.1 to 50 hrs; and (g) heat treating the dried substrate at 120 to 650 deg.C for 0.1 to 50 hrs. The photoreactor comprises a hollow quartz tube (14) on the outer surface of which photocatalyst thin film is formed; an ultraviolet lamp (10) which is installed inside the hollow quartz tube to generate light; a socket (8) which supplies electric current to the ultraviolet lamp.
机译:目的:提供一种在基材上具有高活性和强粘附性的光催化剂薄膜的制备方法,以及使用该光催化剂薄膜的水处理设备,以对细菌和废水/污水中的农药和三卤甲烷等难降解有毒化合物进行氧化处理。 。组成:具有高活性和强附着性的光催化剂薄膜的制备方法包括以下步骤:(a)混合1至50 wt。%的钛基无机粘合剂,0.1至30 wt。%的有机溶剂和0.01-5重量%的无机酸,然后搅拌0.1-10小时; (b)混合1至30重量%的有机聚合物和5至50重量%的有机溶剂; (c)将第一步所得的产物与第二步所得的产物混合,然后搅拌0.5至10小时; (d)向第三步骤的所得物中加入1至30重量%的螯合剂,0.001至5重量%的表面活性剂和0.1至10重量%的光催化剂粉末,然后超声处理0.1至10小时以制备光催化剂溶胶(e)通过浸涂或喷涂方法将光催化剂溶胶涂覆在基材上; (f)在50至450℃下干燥涂覆的基材0.1至50小时; (g)将干燥的基材在120至650℃下热处理0.1至50小时。光反应器包括空心石英管(14),在石英管的外表面上形成有光催化剂薄膜。紫外线灯(10)安装在空心石英管内以产生光。插座(8),其向紫外线灯提供电流。

著录项

  • 公开/公告号KR20030020860A

    专利类型

  • 公开/公告日2003-03-10

    原文格式PDF

  • 申请/专利权人 KEEPSOL CO. LTD.;KIM SUNG JOON;

    申请/专利号KR20020064310

  • 发明设计人 KIM SUNG JOON;MUN JEONG HO;

    申请日2002-10-21

  • 分类号B01J21/06;

  • 国家 KR

  • 入库时间 2022-08-21 23:47:33

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