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- - MICRO PATTERN INSPECTING DEVICE CONTROL DEVICE OF CD-SEM DEVICE MICRO PATTERN INSPECTING METHOD CONTROL METHOD OF CD-SEM DEVICE PROGRAM AND RECORDING MEDIUM WHICH IS READABLE WITH COMPUTER
- - MICRO PATTERN INSPECTING DEVICE CONTROL DEVICE OF CD-SEM DEVICE MICRO PATTERN INSPECTING METHOD CONTROL METHOD OF CD-SEM DEVICE PROGRAM AND RECORDING MEDIUM WHICH IS READABLE WITH COMPUTER
PURPOSE: To provide a highly accurate and high speed micro pattern inspecting method and system and a CD-SEM device managing method and system. CONSTITUTION: The micro pattern inspecting system 10 is used, which has a computer 120 and memories MR1 and MR2 and is connected between the CD-SEM device 110 and a section SEM device to respectively receive a secondary electronic signal and the section form data of the pattern. A first secondary electronic signal, obtained by irradiating a plurality of test patterns formed in different sectional forms on the same base as the base on which a pattern to be inspected is formed with an electron beam, is separated into a first function including the outline forms of the sections of the test patterns as arguments, a second function defined by a step function in accordance with the qualities of materials of the test patterns and a third function showing the size of distortion of the signal by a variable separation. The functions are respectively stored in the memory MR2, and then, the data of a second secondary electronic signal obtained by irradiating the pattern to be inspected with an electron beam is obtained. Then, components based on the sectional form of the pattern to be inspected are extracted from the second secondary electronic signal by using the first to third functions.
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