首页> 外国专利> - - MICRO PATTERN INSPECTING DEVICE CONTROL DEVICE OF CD-SEM DEVICE MICRO PATTERN INSPECTING METHOD CONTROL METHOD OF CD-SEM DEVICE PROGRAM AND RECORDING MEDIUM WHICH IS READABLE WITH COMPUTER

- - MICRO PATTERN INSPECTING DEVICE CONTROL DEVICE OF CD-SEM DEVICE MICRO PATTERN INSPECTING METHOD CONTROL METHOD OF CD-SEM DEVICE PROGRAM AND RECORDING MEDIUM WHICH IS READABLE WITH COMPUTER

机译:CD-SEM的微图案检查装置控制装置CD-SEM的微图案检查方法控制方法及记录介质可通过计算机读取

摘要

PURPOSE: To provide a highly accurate and high speed micro pattern inspecting method and system and a CD-SEM device managing method and system. CONSTITUTION: The micro pattern inspecting system 10 is used, which has a computer 120 and memories MR1 and MR2 and is connected between the CD-SEM device 110 and a section SEM device to respectively receive a secondary electronic signal and the section form data of the pattern. A first secondary electronic signal, obtained by irradiating a plurality of test patterns formed in different sectional forms on the same base as the base on which a pattern to be inspected is formed with an electron beam, is separated into a first function including the outline forms of the sections of the test patterns as arguments, a second function defined by a step function in accordance with the qualities of materials of the test patterns and a third function showing the size of distortion of the signal by a variable separation. The functions are respectively stored in the memory MR2, and then, the data of a second secondary electronic signal obtained by irradiating the pattern to be inspected with an electron beam is obtained. Then, components based on the sectional form of the pattern to be inspected are extracted from the second secondary electronic signal by using the first to third functions.
机译:目的:提供一种高精度,高速的微图案检测方法和系统以及一种CD-SEM设备管理方法和系统。构成:使用微图案检查系统10,其具有计算机120和存储器MR1和MR2,并且连接在CD-SEM装置110和截面SEM装置之间,以分别接收二次电子信号和截面SEM数据。模式。通过以与电子束形成要检查的图案的基底相同的基底照射在相同基底上的,以不同截面形式形成的多个测试图案的辐射而获得的第一二次电子信号被分离为包括轮廓形式的第一功能。在测试图案的各部分中作为参数,根据测试图案的材料的质量由阶跃函数定义的第二函数和通过可变间隔示出信号失真的大小的第三函数。将功能分别存储在存储器MR2中,然后,获得通过用电子束照射要检查的图案而获得的第二二次电子信号的数据。然后,通过使用第一至第三功能从第二二次电子信号中提取基于要检查的图案的截面形式的成分。

著录项

  • 公开/公告号KR20030028389A

    专利类型

  • 公开/公告日2003-04-08

    原文格式PDF

  • 申请/专利权人 KABUSHIKI KAISHA TOSHIBA;

    申请/专利号KR20020058290

  • 发明设计人 IKEDA TAKAHIRO;

    申请日2002-09-26

  • 分类号H01L21/66;

  • 国家 KR

  • 入库时间 2022-08-21 23:47:25

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