Projection exposure system, especially for micro-lithography, has position sensitive correction sensor element that detects wavefront of measurement light beam or beams

摘要

The system has a correction sensor arrangement (41) containing a light source (11) that emits at least one measurement light beam (10) that passes through at least part of the projection optics (1) and that lies outside the projection light beam (5) before it enters and after it leaves the projection optics. A position sensitive correction sensor element (37) detects the wavefront of the measurement light beam or beams. AN Independent claim is also included for the following: a method of compensating imaging errors in an inventive system.