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Semiconducting structure for controling current has channel region with channel conduction region of first conductivity type and higher than basic doping level of channel region

机译:用于控制电流的半导体结构具有沟道区,该沟道区具有第一导电类型的沟道导电区并且高于沟道区的基本掺杂水平。

摘要

The arrangement has at least a first semiconductor region (2) of a first conductivity type at least partly containing a current path and a channel region (22) forming part of the first region with a basic doping level and current influenced by at least one depletion zone (23,24). The channel region has a channel conduction region (225) for guiding a current that is of the first conductivity type with higher than the basic doping level. AN Independent claim is also included for the following: a method of manufacturing a semiconducting structure for controling a current.
机译:该装置具有至少部分地包含电流路径的第一导电类型的至少第一半导体区域(2)和形成该第一区域的一部分的沟道区域(22),该沟道区域(22)具有受至少一个耗尽影响的基本掺杂水平和电流。区(23,24)。沟道区具有沟道导通区(225),该沟道导通区用于引导具有高于基本掺杂水平的第一导电类型的电流。还包括以下内容的独立权利要求:一种制造用于控制电流的半导体结构的方法。

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