Forming micro-cavities with optically-transparent walls, produces silicon region surrounded by transparent etch-resist with hole permitting silicon removal by etching

摘要

A silicon region (7) is produced. This is surrounded on all sides by an optically-transparent covering layer (2, 5). An opening (6) is formed in the covering layer. The silicon (7) surrounded by the covering layer, is dissolved-out through the opening, the layer acting as an etch-resist.