A method for determining at least one parameter, the for the illumination angle distribution of one of the illumination of an object of the light source, which is characteristic of a projection exposure apparatus

摘要

For the determination of at least one parameter, the for the illumination angle distribution of one of the illumination of an object of the light source used for a projection exposure apparatus, in particular for microlithography, characteristic is, initially, a filter element (8) in the area of a pupil plane is a part of the projection exposure apparatus (28 introduced). The filter element (8) has a in to the optical axis of the illumination optics filter function which varies the azimuth direction. Subsequently, the illumination intensity of the light source in a plane in the beam path of the pupil plane is measured (29). The filter element (8) is then twisted about the optical axis (30) and the illumination intensity of the light source is measured again (31). Finally, the at least one parameter from the filter function, the angle of rotation and the measured illumination intensities is calculated (32). With this method can be rapidly and precisely determine the parameter.