首页> 外国专利> Method for controlling rotation of a semiconductor disk during high temperature treatment measures the temperature of the disk with a pyrometer as a function of time

Method for controlling rotation of a semiconductor disk during high temperature treatment measures the temperature of the disk with a pyrometer as a function of time

机译:在高温处理期间控制半导体盘旋转的方法用高温计测量盘的温度作为时间的函数

摘要

A gas tight sealed quartz chamber (1) with a graphite support/susceptor (2) coated with silicon carbide holds a semiconductor disk (3). Halogen lamps (4) with infrared beams heat up the semiconductor disk to the right temperature. A temperature sensor (5) and a pyrometer (7) measure the disk's temperature to be compared by a master computer (6) with a stored target temperature.
机译:具有涂覆有碳化硅的石墨支撑/基座(2)的气密密封石英室(1)保持着半导体盘(3)。带有红外光束的卤素灯(4)将半导体磁盘加热到合适的温度。温度传感器(5)和高温计(7)测量磁盘的温度,以便由主计算机(6)与存储的目标温度进行比较。

著录项

  • 公开/公告号DE10220639A1

    专利类型

  • 公开/公告日2002-12-05

    原文格式PDF

  • 申请/专利权人 WACKER SILTRONIC AG;

    申请/专利号DE2002120639

  • 发明设计人 VORDERWESTNER MARTIN;BRENNINGER GEORG;

    申请日2002-05-08

  • 分类号H01L21/324;

  • 国家 DE

  • 入库时间 2022-08-21 23:41:59

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