首页> 外国专利> Control system, for a vacuum deposition assembly, has a computer-controlled deflection module for the electron beam to set the beam sweep movements for a consistent coating of the whole substrate surface

Control system, for a vacuum deposition assembly, has a computer-controlled deflection module for the electron beam to set the beam sweep movements for a consistent coating of the whole substrate surface

机译:用于真空沉积组件的控制系统,具有计算机控制的偏转模块,用于电子束,以设置电子束扫描运动,以对整个基板表面进行一致的涂覆

摘要

The control system for the sweep movement of an electron beam (14), in a vacuum deposition assembly (1), has a deflection module (23,27) which is operated according to selected functions. The electron beam is moved in two co-ordinate directions. At least one of the selected functions is a term with time changes which varies the periodicity of the electron beam sweep and its co-ordinate direction. The term can be set manually or automatically. The assembly is operated by a control unit (7). The basic beam deflection is at a frequency of 4-150 Hz with a wobbling frequency of 50-500 Hz.
机译:在真空沉积组件(1)中,用于电子束(14)的扫掠运动的控制系统具有偏转模块(23,27),该偏转模块根据选择的功能进行操作。电子束沿两个坐标方向移动。所选择的函数中的至少一个是具有时间变化的术语,该术语改变电子束扫描的周期性及其坐标方向。该术语可以手动或自动设置。该组件由控制单元(7)操作。基本光束偏转频率为4-150 Hz,摆动频率为50-500 Hz。

著录项

  • 公开/公告号DE10222729A1

    专利类型

  • 公开/公告日2003-01-23

    原文格式PDF

  • 申请/专利权人 CARL ZEISS;

    申请/专利号DE2002122729

  • 发明设计人 MALISCHKE ROLAND;

    申请日2002-05-23

  • 分类号H01J37/305;C23C14/30;C23C14/22;

  • 国家 DE

  • 入库时间 2022-08-21 23:42:02

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