Material measure and calibrating norm for recording lateral dimensions on nano-scale objects for microscopy and linear measurement uses a measuring structure on a carrier surface.

摘要

A material measure (10) on a carrier surface (11) for a microchip (12) has a single structure (13) periodically repeating itself at certain times. Each period is associated with a single structure and a recess (14) of silicon with a clearance and the sloping sides (15,16) of these are undercut in an arched manner. Between a surface (17) for the single structures and their undercut sloping sides there are sharp exact limiting edges (18,19).