首页> 外国专利> STICKING DEVICE FOR ABRASIVE BLOCK AND METHOD FOR THE SAME, ABRASIVE DEVICE USING ABRASIVE MEMBER PRODUCED BY THE DEVICE OR THE METHOD, PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE USING ABRASIVE DEVICE AND SEMICONDUCTOR DEVICE PRODUCED BY PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE

STICKING DEVICE FOR ABRASIVE BLOCK AND METHOD FOR THE SAME, ABRASIVE DEVICE USING ABRASIVE MEMBER PRODUCED BY THE DEVICE OR THE METHOD, PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE USING ABRASIVE DEVICE AND SEMICONDUCTOR DEVICE PRODUCED BY PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE

机译:磨料块的粘贴装置及其方法,使用该设备生产的磨料的磨料装置或方法,使用磨料设备的半导体装置的生产方法和生产半导体装置的半导体装置的方法

摘要

PROBLEM TO BE SOLVED: To provide a sticking device which prevents bubbles from being formed in a space between an abrasive pad (abrasive block) and a pad plate (polishing support) and sticks the abrasive pad on a sticking surface of the pad plate in a flat state, and also to provide a method used for the same.;SOLUTION: The sticking device 50 sticks the abrasive pad 40c on the sticking surface 40b of an abrasive member 4 comprising an abrasive pad 40c to abut with a surface to be polished of a semiconductor wafer W and carry out polishing, and a pad plate 40a having the sticking surface 40b on which the abrasive pad 40c is stuck and held flat. This sticking device 50 is provided with a support tool 70 for the abrasive pad 70 to suck the abrasive pad 40c and hold it in a flat state and an air cylinder 60. The support tool 70 for the abrasive pad is swingably supported by an lower end of a piston rod 62 of the air cylinder 60 and moved toward the sticking surface 40b with the air cylinder 60, and the support tool 70 for the abrasive pad presses the abrasive pad 40c held flat on the support tool 70 for the abrasive pad on the abrasive surface 40b and stick it thereon.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:提供一种防止在研磨垫(磨料块)和垫板(抛光支撑件)之间的空间中形成气泡的粘附装置,并将研磨垫粘附在垫板的粘附表面上。解决方案:粘附装置50将研磨垫40c粘附在包括研磨垫40c的研磨构件4的粘附表面40b上,以与要抛光的表面邻接。半导体晶片W进行抛光,并具有垫板40a,垫板40a具有粘附表面40b,研磨垫40c被粘附并保持平坦。该粘贴装置50设置有用于使磨垫70吸附并保持平坦状态的用于磨垫70的支撑工具70和气缸60。用于磨垫的支撑工具70由下端可摆动地支撑。气缸60的活塞杆62的旋转,并与气缸60朝着粘附表面40b移动,并且用于研磨垫的支撑工具70将保持平坦的研磨垫40c压在用于研磨垫的支撑工具70上。磨料表面40b并粘贴在其​​上。;版权所有:(C)2004,日本特许厅

著录项

  • 公开/公告号JP2004017188A

    专利类型

  • 公开/公告日2004-01-22

    原文格式PDF

  • 申请/专利权人 NIKON CORP;

    申请/专利号JP20020172708

  • 发明设计人 HOSHINO SUSUMU;

    申请日2002-06-13

  • 分类号B24B37/00;H01L21/304;

  • 国家 JP

  • 入库时间 2022-08-21 23:33:05

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号