METHOD OF ELECTRON BEAM LITHOGRAPHY, METHOD FOR MANUFACTURING MATRIX, MATRIX, METHOD FOR MANUFACTURING MOLD, MOLD, OPTICAL ELEMENT, AND ELECTRON BEAM LITHOGRAPHY APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a method of electron beam lithography by which processing errors accumulated in other steps are eliminated and corrected and a diffractive structure providing predetermined optical performances can be drawn.;SOLUTION: For example, when the error δt of height position of the object face for lithography (a curved face part 100a) is positive, the dose Dm for drawing the part is controlled to be larger for lithography by the degree corresponding to the error δt than the designed dose D0. When the error δt is negative, the dose Dm for lithography is controlled to be smaller for plotting by the degree corresponding to the error δt than the designed dose D0. Thereby, the process error (the error δt1 of the height position on the mother optical face 110a from the designed value) in a shaping step or the process error in a resist forming step (the error δt2 in the film thickness of a resist applied on the mother optical face 110a from a specified thickness) are eliminated and a given profile can be obtained. That is, a diffractive structure with which specified optical performances can be obtained can be drawn.;COPYRIGHT: (C)2004,JPO&NCIPI