FIELD EMISSION TYPE ELECTRON SOURCE AND MANUFACTURING METHOD OF FIELD EMISSION TYPE ELECTRON SOURCE

摘要

PROBLEM TO BE SOLVED: To provide a field emission type electron source in which variation within the surface of the electron emission characteristics is small compared with that of a conventional art, and its manufacturing method.;SOLUTION: A plurality of lower electrodes 12 are formed on one surface of a glass substrate 11 (Figure (a)), and an infrared reflecting film 13 is formed on the other surface side of the glass substrate 11 (Figure (b)). Then, while heating the glass substrate 11 from the other surface side, an undoped polycrystalline silicon layer 3 is formed on the one surface side of the glass substrate 11 (Figure (c)). After a first compound nano-crystalline layer in which numerous grains of polycrystalline silicon and numerous silicon microcrystals are intermingled is formed by a nano-crystallization process, the first compound nano-crystalline layer is oxidized electrochemically, and an intense-field drift layer 6 is formed (Figure (d)). Then, a surface electrode 7 made of gold thin film is formed (Figure (e)).;COPYRIGHT: (C)2004,JPO&NCIPI