首页> 外国专利> SRAM CELL WITH REDUCED STANDBY LEAKAGE CURRENT AND METHOD OF FORMING SAME

SRAM CELL WITH REDUCED STANDBY LEAKAGE CURRENT AND METHOD OF FORMING SAME

机译:具有降低的待机泄漏电流的SRAM单元及其形成方法

摘要

PROBLEM TO BE SOLVED: To suppress the standby leakage current of a SRAM cell, i.e. suppress the standby leakage current without having any adverse effects on performance.;SOLUTION: In an integrated circuit comprising a SRAM cell 4 including a p-channel transistor 8 and a n-channel transistor 6 and a logic part 5 including a p-channel transistor 10, leakage current is reduced by increasing the threshold voltage of the SRAM p-channel transistor 8. Specifically, this is achieved by forming the gate oxide film 22 of the SRAM p-channel transistor 8 thicker than the SRAM n-channel transistor 6 and the gate oxide film 30 of the transistor 10 of the logic part 5, or by utilizing the effective thickening of a gate oxide film due to an increase in a depletion layer through counter doping the p-type gate electrode of the SRAM p-channel transistor with n-type impurities.;COPYRIGHT: (C)2004,JPO
机译:解决的问题:抑制SRAM单元的待机泄漏电流,即在不对性能造成任何不利影响的情况下抑制待机泄漏电流。解决方案:在包括SRAM单元4的集成电路中,该SRAM单元4包括p沟道晶体管8和在n沟道晶体管6和包括p沟道晶体管10的逻辑部分5中,通过增加SRAM p沟道晶体管8的阈值电压来减小泄漏电流。具体而言,这是通过形成栅极的氧化膜22来实现的。 SRAM p沟道晶体管8比SRAM n沟道晶体管6和逻辑部分5的晶体管10的栅极氧化膜30厚通过对n型杂质对SRAM p沟道晶体管的p型栅电极进行反掺杂形成层; COPYRIGHT:(C)2004,JPO

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号