SOLVENT AND PHOTORESIST COMPOSITION FOR 193NM IMAGING

摘要

PROBLEM TO BE SOLVED: To provide a new photoresist suitable for short-wavelength active radiation exposure imaging at ≤200 nm, in particular, including 193 nm wavelength.;SOLUTION: The photosensitive composition contains a high molecular weight compound as a binder which is a polymer having substantially no aromatic moiety and having a photoacid-labile repeating unit. Moreover, the composition contains one or more photo active components such as a photoacid generating agent compound, methyl isoamyl ketone (5-methyl-2-hexanone) as a solvent, and one or more kinds of solvents such as propylene glycol methylether acetate, cyclohexanone, or the like.;COPYRIGHT: (C)2004,JPO