首页> 外国专利> LIQUID PHASE EPITAXIAL GROWTH DEVICE AND METHOD OF MANUFACTURING LIQUID PHASE EPITAXIAL GROWTH DEVICE

LIQUID PHASE EPITAXIAL GROWTH DEVICE AND METHOD OF MANUFACTURING LIQUID PHASE EPITAXIAL GROWTH DEVICE

机译:液相表位生长装置及制造方法

摘要

PROBLEM TO BE SOLVED: To provide a liquid phase epitaxial growth device and a method of manufacturing the liquid phase epitaxial growth in which a p-n-p-n layer is not formed in an area near a composition interface and a light emitting diode can be manufactured at a higher yield.;SOLUTION: Since Zn does not diffuse into a solution including a fused raw material 29c for the growth of an n-type layer by individually purifying solutions including fused raw materials 29a to 29c by controlling a slider 30 to slide over a board 23 for storing the solution including the fused raw material, the p-n-p-n layer is not formed at the area near the composition interface and thereby a light emitting diode can be manufactured at the higher manufacturing yield.;COPYRIGHT: (C)2004,JPO&NCIPI
机译:解决的问题:提供一种液相外延生长装置和制造液相外延生长的方法,其中在组合物界面附近的区域中不形成pnpn层,并且可以以更高的产率制备发光二极管。解决方案:由于Zn不会通过控制滑块30在电路板23上滑动来单独纯化包含熔融原材料29a至29c的溶液,从而不会扩散到包含用于n型层生长的熔融原材料29c的溶液中。储存包含熔融原料的溶液时,不会在成分界面附近的区域形成pnpn层,从而可以以更高的生产良率来制造发光二极管。版权所有:(C)2004,JPO&NCIPI

著录项

  • 公开/公告号JP2004221174A

    专利类型

  • 公开/公告日2004-08-05

    原文格式PDF

  • 申请/专利权人 HITACHI CABLE LTD;

    申请/专利号JP20030004373

  • 申请日2003-01-10

  • 分类号H01L21/208;C30B19/00;C30B29/40;H01L33/00;

  • 国家 JP

  • 入库时间 2022-08-21 23:28:23

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