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Method of making a single chip and complementary MOS transistors and vertical-type npn bipolar transistor for high-speed

机译:高速制造单芯片的方法以及互补型mos晶体管和垂直型npn双极晶体管

摘要

The present invention is directed to a method of making a single chip vertical-type and npn bipolar transistor of high speed, and complementary MOS transistors. In order to produce a single chip and vertical-type npn bipolar transistor for high-speed, and complementary MOS transistors, fabrication of vertical structure of the emitter-collector in the active region of the npn transistor, and the base, and emitter collector region, the base region and I want to run before the creation of the gate insulating layer and the well with respect to the MOS transistor, all the steps of the technical structure of the horizontal direction of the area.
机译:本发明涉及一种制造高速单芯片垂直型和npn双极晶体管的方法,以及互补的MOS晶体管。为了生产用于高速的单芯片和垂直型npn双极晶体管以及互补MOS晶体管,需要在npn晶体管的有源区,基极和发射极集电极区中垂直构造发射极-集电极。 ,相对于MOS晶体管,基极区和我要在创建栅绝缘层和阱之前先进行该区域水平方向的技术结构的所有步骤。

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