首页> 外国专利> Cleaning and etching, developing, liquid saving type liquid supply nozzles for use in wet processing including peeling, liquid saving type liquid supply nozzle apparatus and wet processing device

Cleaning and etching, developing, liquid saving type liquid supply nozzles for use in wet processing including peeling, liquid saving type liquid supply nozzle apparatus and wet processing device

机译:用于包括剥离的湿法处理的清洁和蚀刻,显影,省液型液体供应喷嘴,省液型液体供应喷嘴装置和湿处理装置

摘要

PROBLEM TO BE SOLVED: To prevent wet processing liquid from leaking out or to reduce a leakage of processing liquid to a minimum by a method wherein a reticulated opening which is opened toward a wet processing object is provided to an intersection where the other edges of an introduction path and a discharged path are made to cross each other. ;SOLUTION: A wet processing feed nozzle 2 is equipped with an introduction path 100 possessed of an inlet 7 at its one end through which wet processing liquid 5 is introduced, and a discharge path 12 possessed of an outlet 15 at its one end through which used wet processing liquid 5' is discharged out of a wet processing system, the other ends of the introduction path 10 and the discharge path 12 are made to cross each other at an intersection 14, and an opening 6 which is opened toward a wet processing object (substrate) 1 is provided to the intersection 14. The opening 6 is of reticulated structure, wherein seven large circles are arranged in two rows in the opening 6 in its lengthwise direction. Furthermore small circles and smaller circles are provided in spaces between the large circles so as to make the opening as large in total aperture area as possible.;COPYRIGHT: (C)1998,JPO
机译:要解决的问题:为了防止湿的处理液泄漏或将处理液的泄漏减少到最小程度,该方法是向交叉点设置一个向湿的处理对象开口的网状开口,在该交叉点处,引入路径和排出路径彼此交叉。解决方案:湿法处理进料喷嘴2的引入路径100的一端具有入口7,通过该入口7引入了湿法处理液体5;排出路径12的一端具有出口15,通过该出口15设有出口15。用过的湿式处理液5'从湿式处理系统中排出,导入路径10和排出路径12的另一端在交叉点14处彼此交叉,并且开口6朝向湿式处理开口物体(基片)1设置在交叉点14上。开口6是网状结构,其中在开口6中沿其长度方向在两行中排列有七个大圆。此外,在大圆圈之间的空间中设置了小圆圈和小圆圈,以使开口的总孔径面积尽可能大。;版权所有:(C)1998,JPO

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