首页>
外国专利>
Cleaning and etching, developing, liquid saving type liquid supply nozzles for use in wet processing including peeling, liquid saving type liquid supply nozzle apparatus and wet processing device
Cleaning and etching, developing, liquid saving type liquid supply nozzles for use in wet processing including peeling, liquid saving type liquid supply nozzle apparatus and wet processing device
PROBLEM TO BE SOLVED: To prevent wet processing liquid from leaking out or to reduce a leakage of processing liquid to a minimum by a method wherein a reticulated opening which is opened toward a wet processing object is provided to an intersection where the other edges of an introduction path and a discharged path are made to cross each other. ;SOLUTION: A wet processing feed nozzle 2 is equipped with an introduction path 100 possessed of an inlet 7 at its one end through which wet processing liquid 5 is introduced, and a discharge path 12 possessed of an outlet 15 at its one end through which used wet processing liquid 5' is discharged out of a wet processing system, the other ends of the introduction path 10 and the discharge path 12 are made to cross each other at an intersection 14, and an opening 6 which is opened toward a wet processing object (substrate) 1 is provided to the intersection 14. The opening 6 is of reticulated structure, wherein seven large circles are arranged in two rows in the opening 6 in its lengthwise direction. Furthermore small circles and smaller circles are provided in spaces between the large circles so as to make the opening as large in total aperture area as possible.;COPYRIGHT: (C)1998,JPO
展开▼