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Anion source, ion beam analytical instrument and etching device, oxygen radical generator and exhaust gas central processing unit
Anion source, ion beam analytical instrument and etching device, oxygen radical generator and exhaust gas central processing unit
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机译:阴离子源,离子束分析仪和蚀刻装置,氧自由基发生器和废气中央处理单元
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摘要
PROBLEM TO BE SOLVED: To provide a negative ion source, an ion beam analysis device, an etching device, an oxygen radical generation device and an waste gas processor which can attain a large ion current by generating a surface-like negative ions by utilization of diamond semi-conductor device structure, with a diamond serving as a semi-conductor. ;SOLUTION: A negative ion source comprises: a diamond layer; a low resistance diamond layer which has a lower resistance than that of the diamond layer and is connected to the diamond layer; an electrode 3 which is formed on a surface where the low resistance layer in the diamond layer is not connected; a surface electrode 4 which can transmit a negative ion 12 formed on a surface that is not connected to the diamond layer in the low resistance diamond layer; and an extraction electrode 9 which is disposed in a thickness direction of the diamond layer at a distance from the surface electrode 4.;COPYRIGHT: (C)2000,JPO
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