QUARTZ GLASS TANK FOR ULTRASONIC CLEANING FOR USE IN MANUFACTURING OF SEMICONDUCTOR AND MANUFACTURE THEREOF, AND CLEANING METHOD USING THE QUARTZ GLASS TANK FOR ULTRASONIC CLEANING

摘要

PROBLEM TO BE SOLVED: To provide a quartz glass tank for ultrasonic cleaning having neither etching of the quartz glass nor film peeling and capable of using for a long period, a method for manufacturing the same, and a method for cleaning using the quartz glass tank for ultrasonic cleaning. ;SOLUTION: In a quartz glass tank for ultrasonic cleaning for use in the manufacturing of a semiconductor, the whole surface of the quartz glass tank for ultrasonic cleaning is covered with a fluororesin coating of 10 μm to 5 mm film thickness, a method for manufacturing the quartz glass tank for ultrasonic cleaning for coating to a quartz glass substrate so that the film thickness of the fluororesin coating agent is 10 μm to 5 mm, and a method for cleaning using the quartz glass tank for ultrasonic cleaning, are provided.;COPYRIGHT: (C)2004,JPO