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Method for producing a quartz glass tank for use in ultrasonic cleaning used for fabricating semiconductor and quartz glass tank obtainable from that method
Method for producing a quartz glass tank for use in ultrasonic cleaning used for fabricating semiconductor and quartz glass tank obtainable from that method
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机译:用于制造半导体的用于超声清洗的石英玻璃罐的制造方法以及由该方法可获得的石英玻璃罐
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摘要
An object of the present invention is to provide a quartz glass tank for use in ultrasonic cleaning that can be used for a long time without causing etching or layer peeling of the quartz glass and a method for producing the same.;In order to achieve the objects above, the present invention provides a method for producing a quartz glass tank for ultrasonic cleaning used in fabricating semiconductors, wherein the entire surface thereof is coated with a fluoric resin coating having a film thickness in a range of from 10 µm to 5 mm. The fluoric resin is at least one kind selected from tetrafluoroethylene-perfluoroalkylvinylether resin, perfluoroethylene-propylene resin, ethylene-tetrafluoroethylene resin, ethylene-chlorotrifluoroethylene resin, vinyl fluoride resin, vinylidene fluoride resin and tetrafluoroethylene-perfluorodioxole resin. The method can further comprise that before coating with a fluoric resin a frosting process is applied to the surface of the quartz glass tank.
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