Method for producing a quartz glass tank for use in ultrasonic cleaning used for fabricating semiconductor and quartz glass tank obtainable from that method

摘要

An object of the present invention is to provide a quartz glass tank for use in ultrasonic cleaning that can be used for a long time without causing etching or layer peeling of the quartz glass and a method for producing the same. ;In order to achieve the objects above, the present invention provides a method for producing a quartz glass tank for ultrasonic cleaning used in fabricating semiconductors, wherein the entire surface thereof is coated with a fluoric resin coating having a film thickness in a range of from 10 &mgr;m to 5 mm. The fluoric resin is at least one kind selected from tetrafluoroethylene-perfluoroalkylvinylether resin, perfluoroethylene-propylene resin, ethylene-tetrafluoroethylene resin, ethylene-chlorotrifluoroethylene resin, vinyl fluoride resin, vinylidene fluoride resin and tetrafluoroethylene-perfluorodioxole resin. The method can further comprise that before coating with a fluoric resin a frosting process is applied to the surface of the quartz glass tank.