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METHOD TO REMOVE PARTICULATE CONTAMINATION FROM A SOLUTION BATH
METHOD TO REMOVE PARTICULATE CONTAMINATION FROM A SOLUTION BATH
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机译:从溶液浴中去除颗粒污染物的方法
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摘要
A method of cleaning particulates from a solution bath including at least partially filling a deionized water (DIW) bath for rinsing at least one wafer following chemically cleaning the at least one wafer; rinsing the at least one wafer; transferring the at least one wafer to a downstream process; at least partially draining the DIW from the DIW bath; at least partially filling the DIW bath with a bath cleaning solution; and, applying at least one source of ultrasonic energy to agitate the bath cleaning solution.
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