SOLAR CELL WAFER WASHING METHOD WHICH USES AN OZONE AND HYDROGEN SOLUTION POSSIBILITY METHOD FOR CLEANING A SOLAR CELL WAFER WITH AN OZONE AND HYDROGEN DISSOLVED SOLUTION, CAPABLE OF REMOVING CONTAMINATION

摘要

PURPOSE: A method for cleaning a solar cell wafer with ozone and hydrogen dissolved solutions is provided to remove inorganic contamination and metal contamination by reducing the zeta potential of the contaminations with the dissolved solutions.;CONSTITUTION: Ozone is generated from oxygen(1-1). The ozone is dissolved in ultrapure water(1-2). A first cleaning process for the surface of a wafer is performed with the dissolved ozone solution(1-3). Hydrogen is dissolved in the ultrapure water(1-4). A second cleaning process for the surface of the wafer is performed with the dissolved hydrogen solution clean(1-5). The wafer is dried(1-6).;COPYRIGHT KIPO 2010