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Method of synthesis of hafnium nitrate for HfO2 thin film deposition via ALCVD process
Method of synthesis of hafnium nitrate for HfO2 thin film deposition via ALCVD process
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机译:通过alCVD工艺合成用于HfO2薄膜沉积的硝酸ha的方法
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摘要
A method of preparing a hafnium nitrate thin film includes placing phosphorus pentoxide in a first vessel; connecting the first vessel to a second vessel containing hafnium tetrachloride; cooling the second vessel with liquid nitrogen; dropping fuming nitric acid into the first vessel producing N2O5 gas; allowing the N2O5 gas to enter the second vessel; heating the first vessel until the reaction is substantially complete; disconnecting the two vessels; removing the second vessel from the liquid nitrogen bath; heating the second vessel; refluxing the contents of the second vessel; drying the compound in the second vessel by dynamic pumping; purifying the compound in the second vessel by sublimation to form Hf(NO3)4, and heating the Hf(NO3)4 to produce HfO2 for use in an ALCVD process.
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