METHOD OF SYNTHESIS OF HAFNIUM NITRATE FOR HfO2 THIN FILM DEPOSITION VIA ALCVD PROCESS

摘要

method for producing a thin film is hafnium nitrate placing phosphorus pentoxide in a first container; Connecting a first container to a second container containing hafnium tetrachloride; Cooling the second container with liquid nitrogen; To smoke in the first container (fuming) nitric acid was nakjeok N ₂ O ₅ generating a gas; N ₂ O ₅ for introducing the gas phase to the second container; Heating the first vessel until the reaction is substantially complete; Phase separating the two containers; Removing the second container from the liquid nitrogen; Heating the second container; The step of refluxing the contents of the second container; Drying by the compounds of the second container in a dynamic pumping; Purify the compounds of the second container by sublimation Hf (NO ₃ ) ₄ generating; And, Hf (NO ₃ ) ₄ and the heating includes the step of generating a HfO ₂ is used in ALCVD process.